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Wafer Processing 1 - 3 of 3 items found

APPLIED MATERIALS P5000 MkII MxP Etch System
P5000 Etch System



Chamber A: MxP

Chamber B: MxP

Chamber C: ASP



Additional chambers can be added.



System can be configured for 100mm, 125mm, 150mm and 200mm wafers. (QTY: 1)



APPLIED MATERIALS P5000 MkII PECVD System
P5000 MkII 150mm CVD System
Chamber A: Universal Si3N4 CVD
Chamber B: Universal Si3N4 CVD
Chamber C: Universal Si3N4 CVD

System is completely refurbished and configured for dual RF. Additional chambers can also be added. System can be re-configured any wafer size. (QTY: 1)



APPLIED MATERIALS P5000 MkII PECVD TEOS System
P5000 MkII CVD System
Chamber A: PECVD TEOS
Chamber B: PECVD TEOS
Phase IV Hot Box
ENI OEM-12B RF Generators

Can be configured for 100mm, 125mm, 150mm or 200mm
Additional chambers can be added.
(QTY: 1)






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